{"title":"单个单壁碳纳米管晶体管制造工艺的过程控制监视器","authors":"K. Chikkadi, M. Haluska, C. Hierold, C. Roman","doi":"10.1109/ICMTS.2013.6528167","DOIUrl":null,"url":null,"abstract":"The manufacturing yield of carbon nanotube transistors is very sensitive to changes in fabrication process parameters, while controlling length, density and orientation of nanotubes simultaneously is still proving elusive in batch fabrication processes. Here, we show an electrode design with a yield of up to 45% working transistors despite our batch fabrication process being based on randomly grown nanotubes. Transistor parameter distributions of 765 devices are shown, demonstrating the potential of our design for process monitoring and control.","PeriodicalId":142589,"journal":{"name":"2013 IEEE International Conference on Microelectronic Test Structures (ICMTS)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-03-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Process control monitors for individual single-walled carbon nanotube transistor fabrication processes\",\"authors\":\"K. Chikkadi, M. Haluska, C. Hierold, C. Roman\",\"doi\":\"10.1109/ICMTS.2013.6528167\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The manufacturing yield of carbon nanotube transistors is very sensitive to changes in fabrication process parameters, while controlling length, density and orientation of nanotubes simultaneously is still proving elusive in batch fabrication processes. Here, we show an electrode design with a yield of up to 45% working transistors despite our batch fabrication process being based on randomly grown nanotubes. Transistor parameter distributions of 765 devices are shown, demonstrating the potential of our design for process monitoring and control.\",\"PeriodicalId\":142589,\"journal\":{\"name\":\"2013 IEEE International Conference on Microelectronic Test Structures (ICMTS)\",\"volume\":\"24 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-03-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 IEEE International Conference on Microelectronic Test Structures (ICMTS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2013.6528167\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE International Conference on Microelectronic Test Structures (ICMTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2013.6528167","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Process control monitors for individual single-walled carbon nanotube transistor fabrication processes
The manufacturing yield of carbon nanotube transistors is very sensitive to changes in fabrication process parameters, while controlling length, density and orientation of nanotubes simultaneously is still proving elusive in batch fabrication processes. Here, we show an electrode design with a yield of up to 45% working transistors despite our batch fabrication process being based on randomly grown nanotubes. Transistor parameter distributions of 765 devices are shown, demonstrating the potential of our design for process monitoring and control.