不同堆叠拓扑方法下基于tsv的pdn设计效果比较

G. Charles, P. Franzon
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引用次数: 5

摘要

在本研究中,我们估计、比较和分析了四种芯片堆叠拓扑的PDN效应。芯片堆叠拓扑为:(1)F2B;(2) F2F;(3) B2F;(4) B2B。基于3D IC-PDN设计的芯片堆叠拓扑结构,各种片上互连元件的排列方式在阻抗特性上有所不同。为了降低阻抗效应,将NMOS封装单元集成到PDN系统中来抑制3D-SSN。最后,案例研究的结果表明,相对于F2F拓扑,B2F和F2B芯片堆叠拓扑具有更低的阻抗效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparison of TSV-based PDN-design effects using various stacking topology methods
In this study, we estimate, compare and analyze the PDN effects of four chip-stacking topologies. The chip-stacking topologies are: (1) F2B; (2) F2F; (3) B2F; and (4) B2B. The arrangement of various on-chip interconnect elements based on the chip-stacking topologies specific to the design of 3D IC-PDN, varies in impedance properties. To reduce the impedance effects NMOS decap unit cells are integrated into PDN system to suppress 3D-SSN. Conclusively, the results of the case study indicate B2F and F2B die stacking topologies results in lower impedance effects relative to F2F topology.
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