低维纳米结构界面断裂的原位观察

Y. Takahashi, H. Hirakata, T. Kitamura
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引用次数: 2

摘要

为了定量评价低维纳米级部件的界面强度,在TEM(透射电子显微镜)下,使用配备小型加载装置的特殊支架进行了断裂试验。加载装置包括一个3D压电管和一个放置在加载尖端后面的特殊负载传感器,可以精确控制加载点和测量无穷小的断裂载荷。利用聚焦离子束在多层材料上制备了具有界面边缘的低维纳米级元件。利用该测试系统,成功地从低维SiN/Cu线的界面边缘原位观察裂纹起裂,并定量测量了断裂载荷。利用断裂试验获得的信息,对Cu / SiN界面边缘附近的应力场进行了分析评价。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
In situ observation of interfacial fracture in low-dimensional nanostructures
In order to quantitatively evaluate the interface strength of low-dimensional nanoscale components, a fracture test has been performed in a TEM (transmission electron microscope) using a special holder equipped with a small loading apparatus. The loading apparatus, which involves a 3D piezoelectric tube and a special load sensor placed behind the loading tip, allows precise control of the loading point and the measurement of infinitesimal fracture load. A low-dimensional nanoscale component with interface edges has been fabricated from a multi-layered material using FIB (focused ion beam). With this testing system, an in situ observation of crack initiation from the interface edge of low-dimensional SiN/Cu lines has been successfully implemented along with a quantitative measurement of the fracture load. Using the information obtained from the fracture test, the stress field around the SiN/Cu interface edge has been analytically evaluated.
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