一个简单的分析模型来描述等离子体物质的时间分辨浓度

2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM) Pub Date : 2023-05-01 DOI:10.1109/IITC/MAM57687.2023.10154646

Michael Haase, Nils Dittmar, M. Küchler, Danny Reuter

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引用次数: 0

摘要

基于对蚀刻产物SiF4的时间行为的观察，导出了一个解析模型。根据模型方程中的物理量，引入了可用于描述工艺过程的产率和抑制率。

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A simple analytical model to describe time-resolved concentrations of plasma species

Based on the observations of the time behavior of the etching product SiF4, an analytical model was derived. Based on the physical quantities in the model equation, the production rate and the suppression rate are introduced, which can be used to describe the process.

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来源期刊

2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM)

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