0.1 /spl μ m CMOS的器件和技术挑战

S.S. Wong
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引用次数: 0

摘要

只提供摘要形式。集成电路行业有望在今年年底前推出0.25 /spl μ m的产品,并预计在不到10年的时间内提供0.1 /spl μ m的工艺。我们将回顾未来的挑战,并将重点放在设备和工艺技术的研究机会上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Device and technology challenges for 0.1 /spl mu/m CMOS
Summary form only given. The integrated circuit industry is poised to introduce 0.25 /spl mu/m products before the end of this year, and is projected to deliver 0.1 /spl mu/M process in less than 10 years. We will review the challenges ahead and focus on the research opportunities in device and process technology.
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