纳米CMOS设计中亚阈值和栅极-氧化物隧道同步漏电流分析

Dongwook Lee, Wesley Kwong, D. Blaauw, D. Sylvester
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引用次数: 50

摘要

在本文中,我们开发了一种快速分析大型电路块总泄漏功率的方法,同时考虑栅极泄漏,I/sub门/和亚阈值泄漏,I/sub sub/。在任意CMOS拓扑结构中,I/sub /和I/sub门之间的相互作用使分析变得复杂。考虑到I/sub /和I/sub门/之间的相互作用,我们提出了简单而准确的启发式方法来快速估计状态相关的总泄漏电流。我们将该方法应用于预计100纳米技术的ISCAS基准电路,与SPICE模拟相比,该方法具有出色的精度,平均加速速度提高了20,000倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simultaneous subthreshold and gate-oxide tunneling leakage current analysis in nanometer CMOS design
In this paper we develop a fast approach to analyze the total leakage power of a large circuit block, considering both gate leakage, I/sub gate/, and subthreshold leakage, I/sub sub/. The interaction between I/sub sub/ and I/sub gate/ complicates analysis in arbitrary CMOS topologies. We propose simple and accurate heuristics to quickly estimate the state-dependent total leakage current considering the interaction between I/sub sub/ and I/sub gate/. We apply this method to ISCAS benchmark circuits in a projected 100 nm technology and demonstrate excellent accuracy compared to SPICE simulation with a 20,000X speedup on average.
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