高电场/电流应力条件下SiO2的行为

A. Leblanc, W. Abadeer
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引用次数: 3

摘要

迄今为止,几位研究人员报告的各种结果往往对高电场引起的介电退化机制给出相互矛盾的结论。我们调查了这些差异的原因,并从这项工作中提出了一个更统一的模型。我们发现,随着电场的增加,首先产生正电荷,引起负的Vt位移。在较高的电场下,观察到净电荷的极性反转。就在击穿之前,电子陷阱的产生也伴随着跨导性的严重退化。这种后期的退化是由于界面损伤引起表面状态。这种退化对电介质寿命有最不利的影响。研究了其他电磁场/电流注入应力对寿命的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Behavior of SiO2 Under High Electric Field/Current Stress Conditions
Various results reported to-date by several investigators tend to give conflicting conclusions regarding the mechanism of dielectric degradation due to high electric fields. We have investigated the reasons for these differences and from this work have proposed a more unified model. We have found that as the electric field is increased first positive charges are created causing negative Vt shift. With higher E-fields a reversal in polarity of net charges was observed. Just prior to breakdown, the creation of electron traps was also accompanied by severe degradation in transconductance. This later degradation is due to interface damage giving rise to surface states. This degradation has the most detrimental effect on the dielectric life time. The effect of other levels of E-field/current injection stressing on life time is also investigated.
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