静电放电对CMOS集成电路潜在缺陷及可靠性的影响

N. Guitard, D. Trémouilles, Stéphane Alves, M. Bafleur, Felix Beaudoin, P. Perdu, A. Wislez
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引用次数: 12

摘要

设计了专用试验车,研究了静电放电诱发的潜在缺陷对数字和模拟CMOS电路的影响。CDM和TLP应力都通过一个特定的衬垫施加到这些电路上,该衬垫允许对电路核心施加应力。通过电特性和非破坏性失效分析来定位诱导缺陷。对于数字电路,虽然IDDQ静态电流增加,但功能不受影响。然而,在老化和存储后,观察到IDDQ电流显着增加,表明电路寿命降低。相比之下,即使在非常低的应力水平下,模拟电路也表现出显著的偏移退化,并且在老化后没有恢复。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
ESD induced latent defects in CMOS ICs and reliability impact
A dedicated test vehicle was designed to study the impact of ESD induced latent defects on digital and analog CMOS circuits. Both CDM and TLP stresses were applied to these circuits through a specific pad which allows stressing the circuit core. Both electrical characterization and non-destructive failure analysis were performed to locate the induced defect. For digital circuits, functionality is not affected although the IDDQ quiescent current increased. However, after burn-in and storage, it was observed that the IDDQ current significantly increased suggesting that the circuit lifetime is degraded. In contrast, even at very low stress level, the analog circuit exhibits a dramatic offset degradation and no recovery is observed after burn-in.
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