低温Cu-Cu Gang键合用于RDL-First扇出面板级封装

Kai-Ming Yang, T. Chou, C. Ko, Chen-Hao Lin, Yu-Hua Chen, T. Tseng, Wen‐Wei Wu, Kuan-Neng Chen
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引用次数: 2

摘要

在本文中,低温(190-220℃)Cu-Cu gang键合在低真空压力。低温技术可应用于RDL-first扇出面板级封装(FOPLP)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low Temperature Cu-Cu Gang Bonding for RDL-First Fan-Out Panel Level Package
In this paper, low temperature (190-220°C) Cu-Cu gang bonding at a low vacuum pressure is demonstrated. The low temperature technologies can be applied to the RDL-first Fan-Out panel level package (FOPLP).
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