{"title":"介电击穿强度随介电厚度减小的原因分析","authors":"J. McPherson","doi":"10.1109/IRPS.2016.7574512","DOIUrl":null,"url":null,"abstract":"An intrinsic/fundamental-physics reason is presented for why the dielectric breakdown strength E<sub>bd</sub> reduces with dielectric thickness t<sub>diel</sub>. Through extensive use of layered dipole summations, it is shown that the Lorentz factor L tends to increase with thickness. The increase in L with dielectric thickness produces a higher local electric field (E<sub>loc</sub>) in thicker dielectrics. Higher E<sub>loc</sub> produces more polar-bond distortion (stretching, compressing, bending, etc.) and this leads to a reduction in bond strength. A reduction in bond strength causes E<sub>bd</sub> and TDDB reductions regardless of the actual bond breakage mechanism (standard Boltzmann processes, current driven processes, or hydrogen release processes). While thicker SiO<sub>2</sub> layers have lower E<sub>bd</sub>, all SiO<sub>2</sub> thicknesses tend to breakdown at roughly the same local electric field (E<sub>loc</sub>)<sub>bd</sub> ≈ 40MV/cm.","PeriodicalId":172129,"journal":{"name":"2016 IEEE International Reliability Physics Symposium (IRPS)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"On why dielectric breakdown strength reduces with dielectric thickness\",\"authors\":\"J. McPherson\",\"doi\":\"10.1109/IRPS.2016.7574512\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An intrinsic/fundamental-physics reason is presented for why the dielectric breakdown strength E<sub>bd</sub> reduces with dielectric thickness t<sub>diel</sub>. Through extensive use of layered dipole summations, it is shown that the Lorentz factor L tends to increase with thickness. The increase in L with dielectric thickness produces a higher local electric field (E<sub>loc</sub>) in thicker dielectrics. Higher E<sub>loc</sub> produces more polar-bond distortion (stretching, compressing, bending, etc.) and this leads to a reduction in bond strength. A reduction in bond strength causes E<sub>bd</sub> and TDDB reductions regardless of the actual bond breakage mechanism (standard Boltzmann processes, current driven processes, or hydrogen release processes). While thicker SiO<sub>2</sub> layers have lower E<sub>bd</sub>, all SiO<sub>2</sub> thicknesses tend to breakdown at roughly the same local electric field (E<sub>loc</sub>)<sub>bd</sub> ≈ 40MV/cm.\",\"PeriodicalId\":172129,\"journal\":{\"name\":\"2016 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-04-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS.2016.7574512\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2016.7574512","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
On why dielectric breakdown strength reduces with dielectric thickness
An intrinsic/fundamental-physics reason is presented for why the dielectric breakdown strength Ebd reduces with dielectric thickness tdiel. Through extensive use of layered dipole summations, it is shown that the Lorentz factor L tends to increase with thickness. The increase in L with dielectric thickness produces a higher local electric field (Eloc) in thicker dielectrics. Higher Eloc produces more polar-bond distortion (stretching, compressing, bending, etc.) and this leads to a reduction in bond strength. A reduction in bond strength causes Ebd and TDDB reductions regardless of the actual bond breakage mechanism (standard Boltzmann processes, current driven processes, or hydrogen release processes). While thicker SiO2 layers have lower Ebd, all SiO2 thicknesses tend to breakdown at roughly the same local electric field (Eloc)bd ≈ 40MV/cm.