直接充电测量(DCM)对互连电容测量的好处

Yasuhiro Miyake, M. Goto
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引用次数: 6

摘要

本文讨论了直接电荷测量(DCM)在片上互连电容表征中的应用。测量设备和技术是利用平板显示测试。片上有源器件在DCM测试结构中不是必需的,并且易于实现并行测量。飞至法拉测量灵敏度实现无需片上有源器件。给出了硅基板和玻璃基板的测量结果,包括平行测量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Benefit of Direct Charge Measurement (DCM) on Interconnect Capacitance Measurement
This paper discusses application of direct charge measurement (DCM) on characterizing on-chip interconnect capacitance. Measurement equipment and techniques are leveraged from Flat Panel Display testing. On-chip active device is not an essential necessity for DCM test structure and it is easy to implement parallel measurements. Femto-Farad measurement sensitivity is achieved without having on-chip active device. Measurement results of silicon and glass substrates, including parallel measurements, are presented.
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CiteScore
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