{"title":"直接充电测量(DCM)对互连电容测量的好处","authors":"Yasuhiro Miyake, M. Goto","doi":"10.1109/ICMTS.2009.4814644","DOIUrl":null,"url":null,"abstract":"This paper discusses application of direct charge measurement (DCM) on characterizing on-chip interconnect capacitance. Measurement equipment and techniques are leveraged from Flat Panel Display testing. On-chip active device is not an essential necessity for DCM test structure and it is easy to implement parallel measurements. Femto-Farad measurement sensitivity is achieved without having on-chip active device. Measurement results of silicon and glass substrates, including parallel measurements, are presented.","PeriodicalId":175818,"journal":{"name":"2009 IEEE International Conference on Microelectronic Test Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Benefit of Direct Charge Measurement (DCM) on Interconnect Capacitance Measurement\",\"authors\":\"Yasuhiro Miyake, M. Goto\",\"doi\":\"10.1109/ICMTS.2009.4814644\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper discusses application of direct charge measurement (DCM) on characterizing on-chip interconnect capacitance. Measurement equipment and techniques are leveraged from Flat Panel Display testing. On-chip active device is not an essential necessity for DCM test structure and it is easy to implement parallel measurements. Femto-Farad measurement sensitivity is achieved without having on-chip active device. Measurement results of silicon and glass substrates, including parallel measurements, are presented.\",\"PeriodicalId\":175818,\"journal\":{\"name\":\"2009 IEEE International Conference on Microelectronic Test Structures\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-04-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 IEEE International Conference on Microelectronic Test Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2009.4814644\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2009.4814644","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Benefit of Direct Charge Measurement (DCM) on Interconnect Capacitance Measurement
This paper discusses application of direct charge measurement (DCM) on characterizing on-chip interconnect capacitance. Measurement equipment and techniques are leveraged from Flat Panel Display testing. On-chip active device is not an essential necessity for DCM test structure and it is easy to implement parallel measurements. Femto-Farad measurement sensitivity is achieved without having on-chip active device. Measurement results of silicon and glass substrates, including parallel measurements, are presented.