{"title":"Ni/sub /P的稳定性及其对化学镀Ni-P与熔融锡界面反应的影响","authors":"K. Chen, C. Liu, D. Whalley, D. Hutt","doi":"10.1109/EMAP.2005.1598244","DOIUrl":null,"url":null,"abstract":"The stability of Ni/sub 3/P and its effect on the reaction with molten tin were evaluated in the present study by comparing the reaction behaviour of Ni-P coatings in the as-plated and heat-treated conditions. It was found that after the solder reaction a dark layer of Ni/sub 3/P was formed at the interface on Ni-P coatings in both conditions, but its thickness was thinner on heat-treated coatings than on as-plated coatings. From the compositional analysis on the cross-sections, it was found that not all the P ejected from the interfacial reaction between Sn and Ni-P was consumed by the formation of Ni/sub 3/P, as P was detected in a second layer of interfacial phase which also contained Ni and Sn. The formation of Ni/sub 3/P was found to be characteristic of a diffusion process, whilst the thickness of Ni-P coating consumed during the reaction was found to be linearly proportional to the reaction time. It is concluded that the Ni/sub 3/P phase formed during the solder reaction is not stable and therefore cannot act as an effective barrier to reactions with liquid solders.","PeriodicalId":352550,"journal":{"name":"2005 International Symposium on Electronics Materials and Packaging","volume":"08 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Stability of Ni/sub 3/P and its effect on the interfacial reaction between electroless Ni-P and molten tin\",\"authors\":\"K. Chen, C. Liu, D. Whalley, D. Hutt\",\"doi\":\"10.1109/EMAP.2005.1598244\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The stability of Ni/sub 3/P and its effect on the reaction with molten tin were evaluated in the present study by comparing the reaction behaviour of Ni-P coatings in the as-plated and heat-treated conditions. It was found that after the solder reaction a dark layer of Ni/sub 3/P was formed at the interface on Ni-P coatings in both conditions, but its thickness was thinner on heat-treated coatings than on as-plated coatings. From the compositional analysis on the cross-sections, it was found that not all the P ejected from the interfacial reaction between Sn and Ni-P was consumed by the formation of Ni/sub 3/P, as P was detected in a second layer of interfacial phase which also contained Ni and Sn. The formation of Ni/sub 3/P was found to be characteristic of a diffusion process, whilst the thickness of Ni-P coating consumed during the reaction was found to be linearly proportional to the reaction time. It is concluded that the Ni/sub 3/P phase formed during the solder reaction is not stable and therefore cannot act as an effective barrier to reactions with liquid solders.\",\"PeriodicalId\":352550,\"journal\":{\"name\":\"2005 International Symposium on Electronics Materials and Packaging\",\"volume\":\"08 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 International Symposium on Electronics Materials and Packaging\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EMAP.2005.1598244\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 International Symposium on Electronics Materials and Packaging","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EMAP.2005.1598244","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Stability of Ni/sub 3/P and its effect on the interfacial reaction between electroless Ni-P and molten tin
The stability of Ni/sub 3/P and its effect on the reaction with molten tin were evaluated in the present study by comparing the reaction behaviour of Ni-P coatings in the as-plated and heat-treated conditions. It was found that after the solder reaction a dark layer of Ni/sub 3/P was formed at the interface on Ni-P coatings in both conditions, but its thickness was thinner on heat-treated coatings than on as-plated coatings. From the compositional analysis on the cross-sections, it was found that not all the P ejected from the interfacial reaction between Sn and Ni-P was consumed by the formation of Ni/sub 3/P, as P was detected in a second layer of interfacial phase which also contained Ni and Sn. The formation of Ni/sub 3/P was found to be characteristic of a diffusion process, whilst the thickness of Ni-P coating consumed during the reaction was found to be linearly proportional to the reaction time. It is concluded that the Ni/sub 3/P phase formed during the solder reaction is not stable and therefore cannot act as an effective barrier to reactions with liquid solders.