高压端接技术的瞬态特性

C. Mingués, D. Dragomirescu, G. Charitat
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引用次数: 2

摘要

本文介绍了目前在分立和集成器件中使用的两种保护技术,即偏置环和SIPOS技术的一些实验和建模结果。2D模拟和宏观模型将用于解释用上述技术之一保护的引脚二极管的物理工作,其反向偏置范围从50 V//spl mu/s到3000 V//spl mu/s。将计算结果与实验数据进行了比较,结果吻合较好。从这项工作中可以看出,偏置环技术对高达3000 V//spl mu/s的dV/dt是坚固的,但SIPOS技术无法保护等于300 V//spl mu/s的dV/dt器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transient behaviour of high voltage termination techniques
This paper presents some experimental and modelling results on two protection techniques currently used in both discrete and integrated devices, namely the biased ring and the SIPOS techniques. Both 2D simulations and macro models will be used to explain the physical working of a pin diode protected with one of the aforementioned technique submitted to a varying reverse bias, ranging from 50 V//spl mu/s up to 3000 V//spl mu/s. The results are compared to experimental data and are shown in good agreement. It appears from this work that the biased ring technique is rugged towards dV/dt up to 3000 V//spl mu/s, but the SIPOS one fails to protect the device for dV/dt equal to 300 V//spl mu/s.
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