直接转移原子光滑的Au薄膜到电镀图案上,用于室温下的Au-Au键合

Y. Kurashima, A. Maeda, H. Takagi
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引用次数: 1

摘要

我们演示了一种将金薄层从原子光滑的母片表面直接转移到电镀金表面的技术。从主晶圆上转移出表面均方根粗糙度为0.6 nm的原子光滑金表面。并考察了其在室温气氛下的金-金键合的适用性。获得了约225 MPa的高结合强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct transfer of atomically smooth Au film onto electroplated patterns for room-temperature Au-Au bonding in atmospheric air
We demonstrate a direct transfer technique of Au thin layer onto electroplated Au surface from a surface of atomically smooth master wafer. An atomically smooth Au surface with a root mean square surface roughness of 0.6 nm could be transferred from the master wafer. We also examined its applicability to room-temperature Au-Au bonding in atmosphere. A high bonding strength of about 225 MPa was obtained.
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