使用带InGaZnO通道的beol晶体管进行片上高/低压桥接I/ o和大电流开关的功能电路元件的操作

K. Kaneko, H. Sunamura, M. Narihiro, S. Saito, N. Furutake, M. Hane, Y. Hayashi
{"title":"使用带InGaZnO通道的beol晶体管进行片上高/低压桥接I/ o和大电流开关的功能电路元件的操作","authors":"K. Kaneko, H. Sunamura, M. Narihiro, S. Saito, N. Furutake, M. Hane, Y. Hayashi","doi":"10.1109/VLSIT.2012.6242492","DOIUrl":null,"url":null,"abstract":"Functional circuit elements based on novel BEOL-transistors with a wide-band-gap oxide semiconductor InGaZnO (IGZO) film are integrated onto LSI Cu-interconnects, and their operations are demonstrated. High-current comb-type transistors show excellent Ion/Ioff ratio (>;108) and high-Vd operation with linear area dependence, realizing area-saving compact high-current BEOL switches. Successful operation of voltage-controlled inverter switches with high-Vd enables on-chip bridging I/Os between high/low voltage on conventional Si system LSIs. Setting the gate-to-drain offset design to just 0.1μm realizes +20V enhancement of the breakdown voltage to ~60V with excellent safety operation at around Vd=50V due to the wide-band-gap characteristics.","PeriodicalId":266298,"journal":{"name":"2012 Symposium on VLSI Technology (VLSIT)","volume":"60 4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"13","resultStr":"{\"title\":\"Operation of functional circuit elements using BEOL-transistor with InGaZnO channel for on-chip high/low voltage bridging I/Os and high-current switches\",\"authors\":\"K. Kaneko, H. Sunamura, M. Narihiro, S. Saito, N. Furutake, M. Hane, Y. Hayashi\",\"doi\":\"10.1109/VLSIT.2012.6242492\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Functional circuit elements based on novel BEOL-transistors with a wide-band-gap oxide semiconductor InGaZnO (IGZO) film are integrated onto LSI Cu-interconnects, and their operations are demonstrated. High-current comb-type transistors show excellent Ion/Ioff ratio (>;108) and high-Vd operation with linear area dependence, realizing area-saving compact high-current BEOL switches. Successful operation of voltage-controlled inverter switches with high-Vd enables on-chip bridging I/Os between high/low voltage on conventional Si system LSIs. Setting the gate-to-drain offset design to just 0.1μm realizes +20V enhancement of the breakdown voltage to ~60V with excellent safety operation at around Vd=50V due to the wide-band-gap characteristics.\",\"PeriodicalId\":266298,\"journal\":{\"name\":\"2012 Symposium on VLSI Technology (VLSIT)\",\"volume\":\"60 4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"13\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 Symposium on VLSI Technology (VLSIT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.2012.6242492\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 Symposium on VLSI Technology (VLSIT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2012.6242492","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 13

摘要

基于新型beol晶体管和宽带隙氧化物半导体InGaZnO (IGZO)薄膜的功能电路元件集成到LSI cu互连上,并演示了它们的工作原理。大电流梳状晶体管具有优异的离子/断流比(>;108)和线性面积依赖的高vd操作,实现了节省面积的紧凑大电流BEOL开关。具有高vd的压控逆变开关的成功操作使传统Si系统lsi上的高/低电压之间的片上桥接I/ o成为可能。将栅极-漏极偏置设计设置为0.1μm,击穿电压提高+20V至~60V,并且由于宽带隙特性,在Vd=50V附近具有出色的安全工作性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Operation of functional circuit elements using BEOL-transistor with InGaZnO channel for on-chip high/low voltage bridging I/Os and high-current switches
Functional circuit elements based on novel BEOL-transistors with a wide-band-gap oxide semiconductor InGaZnO (IGZO) film are integrated onto LSI Cu-interconnects, and their operations are demonstrated. High-current comb-type transistors show excellent Ion/Ioff ratio (>;108) and high-Vd operation with linear area dependence, realizing area-saving compact high-current BEOL switches. Successful operation of voltage-controlled inverter switches with high-Vd enables on-chip bridging I/Os between high/low voltage on conventional Si system LSIs. Setting the gate-to-drain offset design to just 0.1μm realizes +20V enhancement of the breakdown voltage to ~60V with excellent safety operation at around Vd=50V due to the wide-band-gap characteristics.
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