A.S. Lujan, Ivan Chueiri, J. Swart, F. Prince, P.H. Tessari
{"title":"扩散沟道和生长沟道mesfet的SPICE直流参数提取","authors":"A.S. Lujan, Ivan Chueiri, J. Swart, F. Prince, P.H. Tessari","doi":"10.1109/ICMTS.1993.292927","DOIUrl":null,"url":null,"abstract":"A procedure for extracting SPICE (simulation program with IC emphasis) DC parameters of GaAs MESFETs is presented. The program developed produces a best fitting of the calculated I-V curves to the experimental characteristics. Devices are fabricated by means of two different processes producing different channel doping structures and different channel length devices. Extracted parameters of these devices are presented and analyzed.<<ETX>>","PeriodicalId":123048,"journal":{"name":"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"SPICE DC parameter extraction of MESFETs with diffused and grown channel\",\"authors\":\"A.S. Lujan, Ivan Chueiri, J. Swart, F. Prince, P.H. Tessari\",\"doi\":\"10.1109/ICMTS.1993.292927\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A procedure for extracting SPICE (simulation program with IC emphasis) DC parameters of GaAs MESFETs is presented. The program developed produces a best fitting of the calculated I-V curves to the experimental characteristics. Devices are fabricated by means of two different processes producing different channel doping structures and different channel length devices. Extracted parameters of these devices are presented and analyzed.<<ETX>>\",\"PeriodicalId\":123048,\"journal\":{\"name\":\"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-03-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.1993.292927\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1993.292927","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
SPICE DC parameter extraction of MESFETs with diffused and grown channel
A procedure for extracting SPICE (simulation program with IC emphasis) DC parameters of GaAs MESFETs is presented. The program developed produces a best fitting of the calculated I-V curves to the experimental characteristics. Devices are fabricated by means of two different processes producing different channel doping structures and different channel length devices. Extracted parameters of these devices are presented and analyzed.<>