{"title":"RTP光管辐射温度计标定试验台的建模与实验结果","authors":"K. Ball, J. Howell","doi":"10.1109/RTP.2004.1441961","DOIUrl":null,"url":null,"abstract":"A thermometry testbed designed for the testing, analysis, and calibration of light pipe thermometers and thermocouple-instrumented silicon wafers used in RTP tools has been constructed, and comparison of measured wafer temperature distributions on the instrumented wafers with light-pipe radiation thermometer measurements have been carried out. The test chamber has been modeled using detailed Monte Carlo simulation including measured specular/diffuse surface properties, and predictions of the model have been compared with measured results and are presented. The chamber is presently being modified to test advanced temperature measurement techniques, which are also described","PeriodicalId":261126,"journal":{"name":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Modeling and experimental results for an RTP light-pipe radiation thermometer calibration testbed\",\"authors\":\"K. Ball, J. Howell\",\"doi\":\"10.1109/RTP.2004.1441961\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A thermometry testbed designed for the testing, analysis, and calibration of light pipe thermometers and thermocouple-instrumented silicon wafers used in RTP tools has been constructed, and comparison of measured wafer temperature distributions on the instrumented wafers with light-pipe radiation thermometer measurements have been carried out. The test chamber has been modeled using detailed Monte Carlo simulation including measured specular/diffuse surface properties, and predictions of the model have been compared with measured results and are presented. The chamber is presently being modified to test advanced temperature measurement techniques, which are also described\",\"PeriodicalId\":261126,\"journal\":{\"name\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RTP.2004.1441961\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RTP.2004.1441961","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Modeling and experimental results for an RTP light-pipe radiation thermometer calibration testbed
A thermometry testbed designed for the testing, analysis, and calibration of light pipe thermometers and thermocouple-instrumented silicon wafers used in RTP tools has been constructed, and comparison of measured wafer temperature distributions on the instrumented wafers with light-pipe radiation thermometer measurements have been carried out. The test chamber has been modeled using detailed Monte Carlo simulation including measured specular/diffuse surface properties, and predictions of the model have been compared with measured results and are presented. The chamber is presently being modified to test advanced temperature measurement techniques, which are also described