侧化对GaAs mesfet的长期影响

H. Cholan, Douglas Stunkard, T. Rubalcava
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引用次数: 5

摘要

本研究的主要目的是监测随时间推移的侧边效应。增强模式和耗尽模式的mesfet,带和不带隔离植入物,在高温下进行了测试。当载流子以负电位接触引入基片时,就会产生侧栅效应。所有电极都采用欧姆触点制造。一旦进入衬底,电子就向正电方向移动。当它们穿过砷化镓衬底时,一些电子被捕获。如果困在场效应管附近,电子可以影响器件的阈值或针尖关电压。在本研究中,通过监测mesfet中的通道电流来测量这种影响。当通道电流减小10%时,FET被认为是侧通的。本研究还研究了磨损失效机制是否使mesfet在老化过程中更容易受到侧翻效应的影响
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Long-term effects of sidegating on GaAs MESFETs
The main purpose of this study was to monitor the effects of sidegating over time. Both enhancement mode and depletion mode MESFETs, with and without isolation implants, were tested at elevated temperatures. The sidegate effect is caused when carriers are introduced into the substrate with a negative potential contact. All electrodes were manufactured with ohmic contacts. Once in the substrate, the electrons move towards more positive potentials. As they move through the GaAs substrate, some electrons are trapped. If trapped near the FET, the electrons can influence the threshold or pinchoff voltage of the device. In this study, the influence was measured by monitoring the channel current in MESFETs. A FET was considered sidegated, when the channel current was reduced by 10%. This study was performed also to investigate whether the wearout failure mechanisms make MESFETs more susceptible to sidegating effects as they age.<>
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