基于脉冲收缩的三维集成电路硅孔预键测试

Chang Hao, Huaguo Liang
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引用次数: 15

摘要

TSV的缺陷不仅会导致传输延迟的变化,而且会导致与TSV相连的网络的过渡延迟的变化。提出了一种基于脉冲收缩的无创键前TSV检测方法,用于检测电阻性开漏故障。tsv被用作驱动门的容性负载,然后到达循环收缩单元的脉冲将被收缩直到完全消失。将收缩量数字化成数字代码,与无故障期望值进行比较。利用45纳米CMOS技术的真实模型,通过HSPICE仿真给出了故障检测实验。结果表明,该方法可有效检测出0.2kΩ以上且等效泄漏电阻小于40MΩ的阻性开口缺陷。该方法的可测试区域成本估计设计对于实际模具来说是可以忽略不计的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pulse shrinkage based pre-bond through silicon vias test in 3D IC
Defects in TSV not only lead to variation in the propagation delay but also in the transition delay of the net connected to the TSV. A non-invasive approach for pre-bond TSV test based on pulse shrinkage is proposed to detect resistive open and leakage fault. TSVs are used as capacitive loads of their driving gates, then the pulse visiting the cyclic shrinkage cells will be shrunk until it vanishes completely. The shrinkage amount is digitized into a digital code to compare with an expected value of fault free. Experiments on fault detection are presented through HSPICE simulations using realistic models for a 45 nm CMOS technology. The results show the effectiveness in the detection of resistive open defects 0.2kΩ above and equivalent leakage resistance less than 40MΩ. The estimated design for testability area cost of our method is negligible for realistic dies.
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