远离硅:互连在新存储技术中的作用

D. J. Wouters
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引用次数: 3

摘要

新的非易失性存储器概念基于非硅材料,实现了新的单元集成方案。存储器元件集成在第一互连层之间,以实现更小的单元尺寸。新的整流材料允许与基板完全解耦和交叉点存储阵列的3-D堆叠,将更多功能转移到后端,并将互连的角色从无源网络转变为有源网络。使用多个有源硅层的硅基存储器也在追求三维堆叠,这带来了新的接触技术挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Moving Away from Silicon: The Role of Interconnect in New Memory Technologies
New non-volatile memory concepts are based on non-Si materials, enabling new cell integration schemes. Memory elements are integrated in-between the first interconnect layers for realizing smaller cell sizes. New rectifying materials allow full decoupling from the substrate and 3-D stacking of cross-point memory arrays, moving more functionality into the back-end, and changing the role of interconnect from a passive to an active network. 3-D stacking is also pursued for Si-based memories using multiple active Si layers, with new contact technology challenges.
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