{"title":"远离硅:互连在新存储技术中的作用","authors":"D. J. Wouters","doi":"10.1109/IITC.2007.382380","DOIUrl":null,"url":null,"abstract":"New non-volatile memory concepts are based on non-Si materials, enabling new cell integration schemes. Memory elements are integrated in-between the first interconnect layers for realizing smaller cell sizes. New rectifying materials allow full decoupling from the substrate and 3-D stacking of cross-point memory arrays, moving more functionality into the back-end, and changing the role of interconnect from a passive to an active network. 3-D stacking is also pursued for Si-based memories using multiple active Si layers, with new contact technology challenges.","PeriodicalId":403602,"journal":{"name":"2007 IEEE International Interconnect Technology Conferencee","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Moving Away from Silicon: The Role of Interconnect in New Memory Technologies\",\"authors\":\"D. J. Wouters\",\"doi\":\"10.1109/IITC.2007.382380\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"New non-volatile memory concepts are based on non-Si materials, enabling new cell integration schemes. Memory elements are integrated in-between the first interconnect layers for realizing smaller cell sizes. New rectifying materials allow full decoupling from the substrate and 3-D stacking of cross-point memory arrays, moving more functionality into the back-end, and changing the role of interconnect from a passive to an active network. 3-D stacking is also pursued for Si-based memories using multiple active Si layers, with new contact technology challenges.\",\"PeriodicalId\":403602,\"journal\":{\"name\":\"2007 IEEE International Interconnect Technology Conferencee\",\"volume\":\"10 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-06-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 IEEE International Interconnect Technology Conferencee\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC.2007.382380\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 IEEE International Interconnect Technology Conferencee","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2007.382380","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Moving Away from Silicon: The Role of Interconnect in New Memory Technologies
New non-volatile memory concepts are based on non-Si materials, enabling new cell integration schemes. Memory elements are integrated in-between the first interconnect layers for realizing smaller cell sizes. New rectifying materials allow full decoupling from the substrate and 3-D stacking of cross-point memory arrays, moving more functionality into the back-end, and changing the role of interconnect from a passive to an active network. 3-D stacking is also pursued for Si-based memories using multiple active Si layers, with new contact technology challenges.