采用先进的三维透射电镜样品制备方法分析闪存STI结构中的位错

Chun-Hung Lin, Hsin-Cheng Hsu, W.M. Hsiao, Chiu-Ru Guey, C. Chan, Huai-San Ku, Dun-Fan Zhuang, Banggu Chen, Ru-Hui Lin, Pe-Lin Hsu, Ko-Chun Lee, S. Chung, C. Yeh, N. Lian, Ta-Hone Yang, K.C. Chen
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引用次数: 0

摘要

利用先进的三维样品制备技术制备TEM薄片,通过平面视图跟踪部分位错位置,并通过进一步的横截面铣削观察细节和破坏类型。双胞胎中Σ = 3,{11 1′′是STI结构中主要的结构缺陷。这些说明为您提供了准备IPFA 2013会刊稿件的基本指南。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dislocation analysis in STI structure of flash memory by advanced 3D TEM sample preparation approach
An advanced 3D sample preparation technique is utilized to prepare TEM lamellas for tracing the partial dislocation site by plan view and observing the details and failure types by further cross-section milling. Primary twins which twin with Σ = 3, {11 1̅} are the major structural defects in STI structure. These instructions give you basic guidelines for preparing your manuscript for IPFA 2013 proceedings.
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