63-75 GHz fT硅基异质结双极技术

G. Patton, J. Comfort, B. Meyerson, E. Crabbé, G. Scilla, E. D. Frésart, J. Stork, J. Sun, D. Harame, J. Burghartz
{"title":"63-75 GHz fT硅基异质结双极技术","authors":"G. Patton, J. Comfort, B. Meyerson, E. Crabbé, G. Scilla, E. D. Frésart, J. Stork, J. Sun, D. Harame, J. Burghartz","doi":"10.1109/VLSIT.1990.111002","DOIUrl":null,"url":null,"abstract":"Experimental results for maximum cut-off frequency (fT) values of 75 and 52 GHz were achieved for SiGe-base and Si-base bipolar transistors with intrinsic base sheet resistances in the 10-17 kΩ/square range. These results extend the speed of silicon bipolar devices into a regime previously reserved to GaAs and other compound semiconductor technologies. Excellent junction characteristics were also obtained for devices as large as 100000 μm2 and for current densities as high as 106 A/cm2. The performance levels obtained for the SiGe transistors, which contain less than 10% germanium in the base, represent almost a factor of two increase in the speed of a Si bipolar transistor. These results demonstrate the significant performance advantage offered by SiGe heterojunction technology","PeriodicalId":441541,"journal":{"name":"Digest of Technical Papers.1990 Symposium on VLSI Technology","volume":"41 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"34","resultStr":"{\"title\":\"63-75 GHz fT SiGe-base heterojunction bipolar technology\",\"authors\":\"G. Patton, J. Comfort, B. Meyerson, E. Crabbé, G. Scilla, E. D. Frésart, J. Stork, J. Sun, D. Harame, J. Burghartz\",\"doi\":\"10.1109/VLSIT.1990.111002\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Experimental results for maximum cut-off frequency (fT) values of 75 and 52 GHz were achieved for SiGe-base and Si-base bipolar transistors with intrinsic base sheet resistances in the 10-17 kΩ/square range. These results extend the speed of silicon bipolar devices into a regime previously reserved to GaAs and other compound semiconductor technologies. Excellent junction characteristics were also obtained for devices as large as 100000 μm2 and for current densities as high as 106 A/cm2. The performance levels obtained for the SiGe transistors, which contain less than 10% germanium in the base, represent almost a factor of two increase in the speed of a Si bipolar transistor. These results demonstrate the significant performance advantage offered by SiGe heterojunction technology\",\"PeriodicalId\":441541,\"journal\":{\"name\":\"Digest of Technical Papers.1990 Symposium on VLSI Technology\",\"volume\":\"41 2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-06-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"34\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Technical Papers.1990 Symposium on VLSI Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.1990.111002\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Technical Papers.1990 Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1990.111002","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 34

摘要

实验结果表明,硅基和硅基双极晶体管的最大截止频率(fT)值分别为75 GHz和52 GHz,其固有基片电阻在10-17 kΩ/平方范围内。这些结果将硅双极器件的速度扩展到以前保留给砷化镓和其他化合物半导体技术的状态。对于100,000 μm2的器件和高达106 A/cm2的电流密度,也获得了出色的结特性。锗含量低于10%的硅双极晶体管的性能水平几乎是硅双极晶体管速度的两倍。这些结果表明SiGe异质结技术具有显著的性能优势
本文章由计算机程序翻译,如有差异,请以英文原文为准。
63-75 GHz fT SiGe-base heterojunction bipolar technology
Experimental results for maximum cut-off frequency (fT) values of 75 and 52 GHz were achieved for SiGe-base and Si-base bipolar transistors with intrinsic base sheet resistances in the 10-17 kΩ/square range. These results extend the speed of silicon bipolar devices into a regime previously reserved to GaAs and other compound semiconductor technologies. Excellent junction characteristics were also obtained for devices as large as 100000 μm2 and for current densities as high as 106 A/cm2. The performance levels obtained for the SiGe transistors, which contain less than 10% germanium in the base, represent almost a factor of two increase in the speed of a Si bipolar transistor. These results demonstrate the significant performance advantage offered by SiGe heterojunction technology
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