300mm晶圆级封装的进展——材料沉积技术的新概念

T. Oppert, J. Kloeser
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引用次数: 1

摘要

在当今竞争激烈的电子市场中生存仍然依赖于制造技术的进步。例如,对于许多半导体制造商来说,过渡到300毫米晶圆已经成为他们对成本高度敏感的市场的必然性。整个先进封装业务正在急剧增长,推动晶圆级封装的动力来自于先进碰撞工艺节省成本的巨大潜力。区域阵列封装(倒装芯片、CSP和BGA)需要形成凸点用于电路板组装。在这里,需要具有成本效益的颠簸方法,不受吞吐量,最小间距和产量的限制。目前,该行业正在寻找新的、更低成本的提升方法,以避免工艺设备的高投资成本。此外,在先进的封装领域有一个高工艺灵活性的需求。这包括其他材料,如粘合剂或环氧树脂必须沉积在晶圆片或板上。由于行业需要将生产转移到300毫米晶圆,这些沉积工艺必须适合这种晶圆尺寸。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Advances in 300 mm wafer level packaging-new concepts of material deposition technologies
Survival in today's competitive electronics market continues to depend on advances on manufacturing technology. For example, the transition to 300 mm wafers has become for many semiconductor manufacturers inevitability in their highly cost-sensitive market. The whole Advanced Packaging Business is growing enormously and the push for wafer-level packaging is driven by the high potential to save cost by advanced bumping processes. Area Array Packages (Flip Chip, CSP and BGA) require the formation of bumps for the board assembly. Here cost effective bumping methods are needed which are not limited by the throughput, minimal pitch and yield. The industry is currently searching for new and lower cost bumping approaches to avoid high investment costs for the process equipment. Furthermore, in the field of advanced packaging there is a demand for high process flexibility. This includes that other materials like adhesives or epoxies must be deposited on the wafer or on boards. Due to the demand of the industry to transfer the production to 300 mm wafer these deposition processes must be suitable for this wafer size.
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