AlGaN/GaN hemt中动态Rdsou瞬态与碳相关缓冲陷阱的相关性

F. Iucolano, A. Parisi, Santo Reina, A. Patti, S. Coffa, G. Meneghesso, G. Verzellesi, F. Fantini, A. Chini
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引用次数: 16

摘要

器件在高漏源电压下工作时观察到的导通电阻增量是限制AlGaN/GaN HEMT器件性能的主题之一。本文对RDSon降解的物理机制进行了研究。采用动态RDSon暂态方法来深入表征陷阱状态。通过计算与RDSon瞬态相关的Arrhenius图,提取了0.86eV的活化能,该活化能可以与由于碳在缓冲液内的结合而产生的陷阱相关联。在一个更简单的结构(TLM)上进行的分析进一步支持了这一假设。通过施加负衬底偏压,研究了仅缓冲陷阱的效果。得到的活化能(0.9eV)与分析RDSon瞬态时得到的活化能相当接近。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Correlation between dynamic Rdsou transients and Carbon related buffer traps in AlGaN/GaN HEMTs
The on resistance increment observed when the device is operated at high drain-source voltages is one the topics that limits the performance of the AlGaN/GaN HEMT devices. In this paper, the physical mechanisms responsible of the RDSon degradation are investigated. The dynamic RDSon transient method is used in order to get insight to characterize the traps states. By calculating the Arrhenius plot associated with the RDSon transients an activation energy of 0.86eV was extracted, that can be correlated to the traps due to the incorporation of Carbon inside the buffer. This hypothesis was further supported by the analyses performed on a simpler structure (TLM). By applying a negative substrate bias the effect of only the buffer traps was studied. A fairly close value of the activation energy (0.9eV) to the one extracted when analyzing the RDSon transient was obtained.
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