S. Schröder, Markus Schröder, W. Reinert, K. H. Priewasser
{"title":"TAIKO晶圆球附件","authors":"S. Schröder, Markus Schröder, W. Reinert, K. H. Priewasser","doi":"10.1109/EPTC.2016.7861519","DOIUrl":null,"url":null,"abstract":"Ball attach on ultra-thin 200 mm TAIKO wafers is considered a challenge but it can be mastered. The TAIKO wafer grinding concept is based on the thinning of an inner area of a silicon wafer leaving an outer ring as stiffening frame for wafer handling without an additional carrier [1]. The process development methodology for a near industrial TAIKO wafer balling pilot line is described. A phased process development methodology was applied with different residual wafer thicknesses, wafer ball diameters and balling pitches to check yield affecting topics and process throughput.","PeriodicalId":136525,"journal":{"name":"2016 IEEE 18th Electronics Packaging Technology Conference (EPTC)","volume":"04 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"TAIKO wafer ball attach\",\"authors\":\"S. Schröder, Markus Schröder, W. Reinert, K. H. Priewasser\",\"doi\":\"10.1109/EPTC.2016.7861519\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ball attach on ultra-thin 200 mm TAIKO wafers is considered a challenge but it can be mastered. The TAIKO wafer grinding concept is based on the thinning of an inner area of a silicon wafer leaving an outer ring as stiffening frame for wafer handling without an additional carrier [1]. The process development methodology for a near industrial TAIKO wafer balling pilot line is described. A phased process development methodology was applied with different residual wafer thicknesses, wafer ball diameters and balling pitches to check yield affecting topics and process throughput.\",\"PeriodicalId\":136525,\"journal\":{\"name\":\"2016 IEEE 18th Electronics Packaging Technology Conference (EPTC)\",\"volume\":\"04 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE 18th Electronics Packaging Technology Conference (EPTC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EPTC.2016.7861519\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 18th Electronics Packaging Technology Conference (EPTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EPTC.2016.7861519","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ball attach on ultra-thin 200 mm TAIKO wafers is considered a challenge but it can be mastered. The TAIKO wafer grinding concept is based on the thinning of an inner area of a silicon wafer leaving an outer ring as stiffening frame for wafer handling without an additional carrier [1]. The process development methodology for a near industrial TAIKO wafer balling pilot line is described. A phased process development methodology was applied with different residual wafer thicknesses, wafer ball diameters and balling pitches to check yield affecting topics and process throughput.