TAIKO晶圆球附件

S. Schröder, Markus Schröder, W. Reinert, K. H. Priewasser
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引用次数: 1

摘要

在超薄的200毫米TAIKO晶圆上附加球被认为是一个挑战,但它是可以掌握的。TAIKO晶圆研磨概念是基于硅片内部区域的减薄,留下外圈作为晶圆处理的强化框架,而无需额外的载体[1]。介绍了TAIKO硅片球化中试生产线的工艺开发方法。采用不同剩余晶圆厚度、晶圆球直径和球距的分阶段工艺开发方法,检查影响主题和工艺吞吐量的良率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
TAIKO wafer ball attach
Ball attach on ultra-thin 200 mm TAIKO wafers is considered a challenge but it can be mastered. The TAIKO wafer grinding concept is based on the thinning of an inner area of a silicon wafer leaving an outer ring as stiffening frame for wafer handling without an additional carrier [1]. The process development methodology for a near industrial TAIKO wafer balling pilot line is described. A phased process development methodology was applied with different residual wafer thicknesses, wafer ball diameters and balling pitches to check yield affecting topics and process throughput.
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