介电环境对单层二硫化钼中电子输运的影响:筛选和远程声子散射

M. L. Van de Put, G. Gaddemane, Sanjay Gopalan, M. Fischetti
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引用次数: 3

摘要

我们从理论上研究了介电环境对单层二硫化钼中电子输运的影响。特别地,我们扩展了我们的第一原理蒙特卡罗方法,以解释层和介电环境中自由载流子对电子-声子相互作用的筛选。此外,我们还考虑了由周围介质引起的远声子散射的影响。对于不同介电基质上的单层MoS2,我们发现筛选可以显著提高迁移率,但包含远声子散射会使迁移率降低到低于其独立值。在我们的模型中,在双栅极配置中引入栅极并不会像在反转层或更厚的薄膜中那样明显地减少远程声子相互作用。然而,对于双栅场效应晶体管,我们仍然获得了合理的输运特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of the Dielectric Environment on Electronic Transport in Monolayer MoS2: Screening and Remote Phonon Scattering
We investigate theoretically the impact of the dielectric environment on electronic transport in monolayer MoS2. In particular, we extend our first-principles Monte Carlo method to account for the screening of the electron-phonon interaction by the free carriers in the layer and the dielectric environment. In addition, we include the effect of remote-phonon scattering induced by the surrounding dielectrics. For monolayer MoS2 on various dielectric substrates, we find that screening could improve the mobility significantly, but the inclusion of remote-phonon scattering degrades the mobility below its free-standing value. In our model, the introduction of gates in a dual-gate configuration does not appreciably decrease the remote-phonon interaction as it does in inversion layers or thicker films. However, for a double-gate field-effect transistor, we still obtain reasonable transport characteristics.
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