铂-氢配合物对硅p+/n二极管特性的影响

Jennifer M. Prohinig, Fabian Rasinger, H. Schulze, G. Pobegen
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引用次数: 1

摘要

利用深能级瞬态光谱(DLTS)研究了p+/n硅二极管中的深能级杂质。观察到三种不同的深能级:两个位于导带以下0.23 eV和0.50 eV的电子陷阱以及一个位于价带以上0.36 eV的空穴陷阱。杂质被确定为铂和铂氢相关缺陷。由电流电压(IV)和电容电压(Cv)的特性,得到了产生寿命和饱和扩散电流。Pt-H配合物的深度剖面是利用逆IV特性计算的。所有的测量结果放在一起,以表明中带隙陷阱,如Pt-H复合物,增加了反向泄漏电流和正向非理想因数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of Platinum-Hydrogen Complexes on Silicon p+/n-Diode Characteristics
Deep level impurities in p+/n silicon diodes are investigated using deep-level transient spectroscopy (DLTS). Three different deep levels are observed: two electron traps located 0.23 eV and 0.50 eV below the conduction band as well as a hole trap 0.36 eV above the valence band. The impurities are identified as platinum and platinum-hydrogen related defects. From current voltage (IV) and capacitance voltage (Cv) characteristics the generation lifetime and the saturation diffusion current are obtained. A depth profile of the Pt-H complex is calculated by using the reverse IV characteristic. All the measurements are put together in order to show that mid-bandgap traps such as Pt-H complex increase the leakage current in reverse and the non-ideality factor in forward operation.
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