包含可变电阻效应的非晶硅薄膜晶体管模型

M. Tanizawa, S. Kikuta, N. Nakagawa, K. Ishikawa, N. Kotani, H. Miyoshi
{"title":"包含可变电阻效应的非晶硅薄膜晶体管模型","authors":"M. Tanizawa, S. Kikuta, N. Nakagawa, K. Ishikawa, N. Kotani, H. Miyoshi","doi":"10.1109/SISPAD.1996.865329","DOIUrl":null,"url":null,"abstract":"A new analytical drain current model including variable series resistance for the a-Si:TFT is presented. Results calculated by the model show very good agreement with experimental results for all operating bias conditions and indicate the scalability over different device geometries.","PeriodicalId":341161,"journal":{"name":"1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)","volume":"71 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-09-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"An amorphous-silicon thin-film transistor model including variable resistance effect\",\"authors\":\"M. Tanizawa, S. Kikuta, N. Nakagawa, K. Ishikawa, N. Kotani, H. Miyoshi\",\"doi\":\"10.1109/SISPAD.1996.865329\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new analytical drain current model including variable series resistance for the a-Si:TFT is presented. Results calculated by the model show very good agreement with experimental results for all operating bias conditions and indicate the scalability over different device geometries.\",\"PeriodicalId\":341161,\"journal\":{\"name\":\"1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)\",\"volume\":\"71 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-09-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.1996.865329\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Conference on Simulation of Semiconductor Processes and Devices. SISPAD '96 (IEEE Cat. No.96TH8095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.1996.865329","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

提出了一种新的含可变串联电阻的A - si:TFT漏极电流解析模型。该模型的计算结果与实验结果在所有工作偏置条件下都有很好的一致性,并表明了该模型在不同器件几何形状下的可扩展性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An amorphous-silicon thin-film transistor model including variable resistance effect
A new analytical drain current model including variable series resistance for the a-Si:TFT is presented. Results calculated by the model show very good agreement with experimental results for all operating bias conditions and indicate the scalability over different device geometries.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信