M. V. Veen, Bart Vereecke, Masahito Sugiura, Y. Kashiwagi, X. Ke, D. Cott, J. Vanpaemel, P. Vereecken, S. Gendt, C. Huyghebaert, Zsolt Tokei
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Electrical and structural characterization of 150 nm CNT contacts with Cu damascene top metallization
This paper discusses the electrical and structural characterization of 150 nm diameter contacts filled with carbon nanotubes (CNTs) and a Cu damascene top metal. We present the first images of CNTs in direct contact with the top metal. A CNT tip clean before metallization reduced the single CNT contact hole resistance from 4.8 kΩ down to 2.8 kΩ (aspect ratio 2.4). The first basic electrical breakdown experiments with Kelvins resulted in high breakdown currents of 5-13 MA/cm2.
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