{"title":"惠斯通桥作为校准测试结构","authors":"U. Kaempf","doi":"10.1109/ICMTS.1995.513940","DOIUrl":null,"url":null,"abstract":"A new test structure for the electrical measurement of level-to-level registration is introduced. This structure, based on the Wheatstone bridge measurement principle, offers improved accuracy over the conventional U-shaped test structure. With the described Wheatstone bridge method, the registration error (misalignment) is directly proportional to a single voltage. In contrast, the misalignment of the U-shaped structure is calculated from the difference of two voltages, an operation that can result in poor precision. The paper describes a two-by-twelve contact pad module, which includes two Wheatstone bridge structures to measure the misalignment in the X- and Y-directions, two calibration structures to determine the zero- and full-scale accuracy, and a Van der Pauw structure to measure the sheet resistance of the conducting material as required for the alignment measurement. The mathematical expressions are derived, and actual test results are discussed.","PeriodicalId":432935,"journal":{"name":"Proceedings International Conference on Microelectronic Test Structures","volume":"62 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"The Wheatstone bridge as an alignment test structure\",\"authors\":\"U. Kaempf\",\"doi\":\"10.1109/ICMTS.1995.513940\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new test structure for the electrical measurement of level-to-level registration is introduced. This structure, based on the Wheatstone bridge measurement principle, offers improved accuracy over the conventional U-shaped test structure. With the described Wheatstone bridge method, the registration error (misalignment) is directly proportional to a single voltage. In contrast, the misalignment of the U-shaped structure is calculated from the difference of two voltages, an operation that can result in poor precision. The paper describes a two-by-twelve contact pad module, which includes two Wheatstone bridge structures to measure the misalignment in the X- and Y-directions, two calibration structures to determine the zero- and full-scale accuracy, and a Van der Pauw structure to measure the sheet resistance of the conducting material as required for the alignment measurement. The mathematical expressions are derived, and actual test results are discussed.\",\"PeriodicalId\":432935,\"journal\":{\"name\":\"Proceedings International Conference on Microelectronic Test Structures\",\"volume\":\"62 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-03-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings International Conference on Microelectronic Test Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.1995.513940\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1995.513940","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The Wheatstone bridge as an alignment test structure
A new test structure for the electrical measurement of level-to-level registration is introduced. This structure, based on the Wheatstone bridge measurement principle, offers improved accuracy over the conventional U-shaped test structure. With the described Wheatstone bridge method, the registration error (misalignment) is directly proportional to a single voltage. In contrast, the misalignment of the U-shaped structure is calculated from the difference of two voltages, an operation that can result in poor precision. The paper describes a two-by-twelve contact pad module, which includes two Wheatstone bridge structures to measure the misalignment in the X- and Y-directions, two calibration structures to determine the zero- and full-scale accuracy, and a Van der Pauw structure to measure the sheet resistance of the conducting material as required for the alignment measurement. The mathematical expressions are derived, and actual test results are discussed.