C. Tanasa, J. Ranish, A. Hunter, S. Ramamurthy, R. Jallepally, B. Ramachandran, C. Lai, A. Tjandra, N. Tam
{"title":"通过仿真改进RTP均匀性","authors":"C. Tanasa, J. Ranish, A. Hunter, S. Ramamurthy, R. Jallepally, B. Ramachandran, C. Lai, A. Tjandra, N. Tam","doi":"10.1109/RTP.2004.1441962","DOIUrl":null,"url":null,"abstract":"Some RTP chamber non-uniformity is due to the lamp arrangement geometry. An internally written simulation program was written to reproduce this non-uniformity. The results of the simulation were successfully tested against experimental results. The simulation then lead to finding lamp types and lamp combination recipes which decrease overall non-uniformity in the RTP chamber by 40%","PeriodicalId":261126,"journal":{"name":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"RTP uniformity improvement through simulation\",\"authors\":\"C. Tanasa, J. Ranish, A. Hunter, S. Ramamurthy, R. Jallepally, B. Ramachandran, C. Lai, A. Tjandra, N. Tam\",\"doi\":\"10.1109/RTP.2004.1441962\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Some RTP chamber non-uniformity is due to the lamp arrangement geometry. An internally written simulation program was written to reproduce this non-uniformity. The results of the simulation were successfully tested against experimental results. The simulation then lead to finding lamp types and lamp combination recipes which decrease overall non-uniformity in the RTP chamber by 40%\",\"PeriodicalId\":261126,\"journal\":{\"name\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RTP.2004.1441962\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RTP.2004.1441962","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Some RTP chamber non-uniformity is due to the lamp arrangement geometry. An internally written simulation program was written to reproduce this non-uniformity. The results of the simulation were successfully tested against experimental results. The simulation then lead to finding lamp types and lamp combination recipes which decrease overall non-uniformity in the RTP chamber by 40%
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