{"title":"用快闪记忆电池作为电荷传感器的金属蚀刻器特性","authors":"S. Alba, A. Colognese, E. Ghio","doi":"10.1109/MAM.1998.887550","DOIUrl":null,"url":null,"abstract":"In this work, flash memory cells in 0.5 /spl mu/m technology have been used as charge sensors to characterize a Transformer Coupled Plasma (TCP) metal etcher. The philosophy of the method is analogous to that of CHARM wafers.","PeriodicalId":302609,"journal":{"name":"European Workshop Materials for Advanced Metallization,","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-03-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Metal etcher characterization using flash memory cells as charge sensors\",\"authors\":\"S. Alba, A. Colognese, E. Ghio\",\"doi\":\"10.1109/MAM.1998.887550\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, flash memory cells in 0.5 /spl mu/m technology have been used as charge sensors to characterize a Transformer Coupled Plasma (TCP) metal etcher. The philosophy of the method is analogous to that of CHARM wafers.\",\"PeriodicalId\":302609,\"journal\":{\"name\":\"European Workshop Materials for Advanced Metallization,\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-03-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Workshop Materials for Advanced Metallization,\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MAM.1998.887550\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Workshop Materials for Advanced Metallization,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MAM.1998.887550","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Metal etcher characterization using flash memory cells as charge sensors
In this work, flash memory cells in 0.5 /spl mu/m technology have been used as charge sensors to characterize a Transformer Coupled Plasma (TCP) metal etcher. The philosophy of the method is analogous to that of CHARM wafers.