微转移打印及潜在工艺优化的有限元分析

K. Buehler, G. Lorenz, M. Mittag, U. Krieger, Niclas Heise, S. Wicht, R. Gerbach, F. Naumann
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引用次数: 0

摘要

微转移印刷($\mu$ TP)作为一种替代的微组装技术,为智能设备的集成和封装开辟了新的可能性,如加工的III/V器件,光学滤波器和CMOS和MEMS上的晶圆级特殊传感器。该技术使用弹性体印章来同时操作多个由于尺寸或易碎性而难以处理的可打印组件。然而,该技术的工业应用以及从实验室规模的转移和升级仍然具有挑战性。为了实现具有足够成品率的可靠印刷过程,必须很好地适应待印刷组件的相互作用,它们通过系绳结构固定在源晶圆上以及转移印章的粘附性。因此,所提出的工作将处理机械实验和有限元建模的结果,以便更深入地了解$\mu$ tp过程,并将允许定义系绳布局和加工源晶圆的优化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Micro-Transfer-Printing and Potential Process Optimizations by FEA
Micro-Transfer-Printing ($\mu$ TP) as an alternative micro-assembly technology opens up new possibilities in the integration and packaging of smart devices like processed III/V devices, optical filters and special sensors on CMOS and MEMS on wafer-level. The technology uses an elastomer stamp to manipulate multiple printable components at the same time that are difficult to handle because of their size or fragility. Nevertheless, the industrial application of this technology as well as the transfer and upscaling from laboratory scale is still challenging. In order to realize a reliable printing process with sufficient yield, the interaction of the components to be printed, their fixation by tether structures to the source wafer and the adhesion of the transfer stamp must be well adapted. Therefore, the presented work will deal with results of mechanical experiments and FEA-modelling in order to get a deeper understanding of the $\mu$ TP-process and will allow a defined tether layout and optimization of the processed source wafers.
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