{"title":"热闪工艺脉冲成形网络及闪光灯的优化设计","authors":"M. Barak","doi":"10.1109/RTP.2004.1441940","DOIUrl":null,"url":null,"abstract":"The design of electrical pulse forming networks (PFN), using multiple coils and energy storage capacitors, has a profound effect on the intensity and temporal shape of the radiant flash emitted from a flashlamp. In addition, the geometrical dimensions of a flashlamp control its electrical impedance (i.e. its interaction with the PFN), and also its explosion energy (i.e. its lifetime expectancy). We present a simple, non iterative algorithm for optimizing the electrical and geometrical design of a bank of flashlamps connected to a high order (multi-section) PFN for use in thermal flash processes. We also describe a full scale 160 kJ system for flash annealing of 300 mm wafers, which was built in our laboratory according to the procedure presented here","PeriodicalId":261126,"journal":{"name":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","volume":"2014 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Optimal design of pulse forming networks and flashlamps for thermal flash processes\",\"authors\":\"M. Barak\",\"doi\":\"10.1109/RTP.2004.1441940\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The design of electrical pulse forming networks (PFN), using multiple coils and energy storage capacitors, has a profound effect on the intensity and temporal shape of the radiant flash emitted from a flashlamp. In addition, the geometrical dimensions of a flashlamp control its electrical impedance (i.e. its interaction with the PFN), and also its explosion energy (i.e. its lifetime expectancy). We present a simple, non iterative algorithm for optimizing the electrical and geometrical design of a bank of flashlamps connected to a high order (multi-section) PFN for use in thermal flash processes. We also describe a full scale 160 kJ system for flash annealing of 300 mm wafers, which was built in our laboratory according to the procedure presented here\",\"PeriodicalId\":261126,\"journal\":{\"name\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"volume\":\"2014 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RTP.2004.1441940\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RTP.2004.1441940","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optimal design of pulse forming networks and flashlamps for thermal flash processes
The design of electrical pulse forming networks (PFN), using multiple coils and energy storage capacitors, has a profound effect on the intensity and temporal shape of the radiant flash emitted from a flashlamp. In addition, the geometrical dimensions of a flashlamp control its electrical impedance (i.e. its interaction with the PFN), and also its explosion energy (i.e. its lifetime expectancy). We present a simple, non iterative algorithm for optimizing the electrical and geometrical design of a bank of flashlamps connected to a high order (multi-section) PFN for use in thermal flash processes. We also describe a full scale 160 kJ system for flash annealing of 300 mm wafers, which was built in our laboratory according to the procedure presented here