直流加速寿命试验下AlGaN/GaN HEMT的捕集效应研究

W. Sun, C. Lee, P. Saunier, S. Ringel, A. Arehart
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引用次数: 6

摘要

基于氮化镓的高电子迁移率晶体管(HEMT)进行了基于直流的加速寿命测试,以确定形成或激活的缺陷水平,以及它们如何影响静态和动态HEMT性能。主要的静态变化是阈值电压的负移和膝关节脱落/导通电阻的增加。应力的主要动态影响表现为导通电阻随时间的增加,这与Ec-0.57和Ec-0.72 eV陷阱的形成和/或激活有关,这些陷阱导致了动态变化,而Ec-1.5 eV陷阱可能导致导通电阻的静态变化。捕获动力学分析表明,EC-0.57和EC-0.72电子态的物理源不是简单的、理想的、非相互作用的点缺陷,而是与物理扩展缺陷(如位错和/或缺陷复合物)有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of trapping effects on AlGaN/GaN HEMT under DC accelerated life testing
GaN-based high electron mobility transistors (HEMTs) were subjected to DC-based accelerated life testing to determine which defect levels form or are activated, and how they impact the static and dynamic HEMT performance. The primary static changes were a negative shift of the threshold voltage and an increase in knee walkout/on-resistance. The primary dynamic effect of the stressing appeared in the form of a time-dependent increase in the on-resistance, and this was found to correlate to first order with formation and/or activation of traps at Ec-0.57 and Ec-0.72 eV traps that contributed to the dynamic changes, and the Ec-1.5 eV trap was likely responsible for the static change in on-resistance. Trapping kinetics analysis revealed that the physical sources for the EC-0.57 and EC-0.72 eV states are not simple, ideal, non-interacting point defects, but instead are associated with physically extended defects, such as dislocations, and/or defect complexes.
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