{"title":"在NGEE ANN POLYTECHNIC的IC制造设施中制造MOS电容器结构","authors":"M. Philip","doi":"10.1109/UGIM.2003.1225755","DOIUrl":null,"url":null,"abstract":"This paper describes an attempt to build and test MOS Capacitor structures at NGEE ANN POLYTECHNIC. This project was undertaken by a group of students. Details of the process flow and test strategies utilized are provided. Problems encountered and solutions taken are reported. The impact of the exercise on student learning is assessed.","PeriodicalId":356452,"journal":{"name":"Proceedings of the 15th Biennial University/Government/ Industry Microelectronics Symposium (Cat. No.03CH37488)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-09-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fabrication of an MOS Capacitor structure at NGEE ANN POLYTECHNIC's IC fabrication facility\",\"authors\":\"M. Philip\",\"doi\":\"10.1109/UGIM.2003.1225755\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes an attempt to build and test MOS Capacitor structures at NGEE ANN POLYTECHNIC. This project was undertaken by a group of students. Details of the process flow and test strategies utilized are provided. Problems encountered and solutions taken are reported. The impact of the exercise on student learning is assessed.\",\"PeriodicalId\":356452,\"journal\":{\"name\":\"Proceedings of the 15th Biennial University/Government/ Industry Microelectronics Symposium (Cat. No.03CH37488)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-09-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 15th Biennial University/Government/ Industry Microelectronics Symposium (Cat. No.03CH37488)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/UGIM.2003.1225755\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 15th Biennial University/Government/ Industry Microelectronics Symposium (Cat. No.03CH37488)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/UGIM.2003.1225755","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabrication of an MOS Capacitor structure at NGEE ANN POLYTECHNIC's IC fabrication facility
This paper describes an attempt to build and test MOS Capacitor structures at NGEE ANN POLYTECHNIC. This project was undertaken by a group of students. Details of the process flow and test strategies utilized are provided. Problems encountered and solutions taken are reported. The impact of the exercise on student learning is assessed.