纳米技术中静态RAM的功率门控电流测试

Yuan-Wei Chao, Hsin-Ling Chen, Chih-Jong Chen, Tsung-Chu Huang
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引用次数: 1

摘要

电流测试分辨率受纳米静态RAM的泄漏高度和变化的限制。本文提出了一种在电源门控睡眠模式下应用电流测试来提高分辨率的新方案。基于双阈值技术,设计了一种新型的细粒度功率门控自适应保持记忆单元结构。为了快速生成测试,还开发了lsb选择解码器。对晶体管级桥接故障的分析证明了测试的有效性。该方案可以探索提高电流分辨率,达到双阈值电压CMOS技术的通用开关强度比。从0.13 μ m技术的模拟结果来看,当前分辨率可提高约40 dB,即100倍。一旦可以为嵌入式内存重新启动当前测试,测试时间就可以大大缩短。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Power-gating current test for static RAM in nanotechnologies
Current test resolution is confined by leakage elevation and variation in the nanometer static RAM. In this paper, we develop a novel scheme to highly improve the resolution by applying current test in power-gating sleep mode. A novel fine-grain power-gated adaptive-retention memory cell structure in the double threshold technology is designed for current testability. An LSB-selected decoder is also developed for fast test generation. Analyses on transistor level bridging faults prove the test effectiveness. The proposed scheme can explore the current resolution improvement up to the generic switch intensity ratio of the double threshold-voltage CMOS technology. From simulations in a 0.13 mum technology, the current resolution can be improved by about 40 dB, i.e., 100 times. Once current test can be renascent for embedded memory, the test time can be dramatically reduced.
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