基于原子力显微镜的电子纳米薄膜力学表征方法

Malgorzata Kopycinska-Muller, A. Striegler, N. Kuzeyeva, B. Kohler, K. Wolter
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引用次数: 0

摘要

我们开发了一种方法来确定局部压痕模量M,厚度范围从几纳米到几百纳米,具有纳米级的横向分辨率。我们在氧化硅和多孔有机硅酸盐玻璃上得到的结果与纳米压痕法得到的结果非常吻合。所使用的方法是所谓的原子力声学显微镜(AFAM)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
AFM based methods for mechanical characterization of Nanothin films in electronics
We have developed a methodology to determine local indentation modulus M for films with thickness ranging from several nanometers to several hundreds of nanometers with nano-scale lateral resolution. Our results obtained for silicon oxide as well as porous organosilicate glasses were in a very good agreement with those provided by nanoindentation methods. The method used is the so-called atomic force acoustic microscopy (AFAM).
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