缺陷监视器的良率预测:总体缺陷的影响[BiCMOS工艺]

Proceedings of International Workshop on Defect and Fault Tolerance in VLSI Pub Date : 1995-11-13 DOI:10.1109/DFTVS.1995.476947

Neil Harrison

{"title":"缺陷监视器的良率预测:总体缺陷的影响[BiCMOS工艺]","authors":"Neil Harrison","doi":"10.1109/DFTVS.1995.476947","DOIUrl":null,"url":null,"abstract":"Accurate yield projection requires an appreciation of the role of gross or area defects. Yield projection from defect monitors can only be successful if the presence of gross defects is handled correctly. This paper presents a technique for the identification of such defects and quantifies the effect on projected yield of varying the criterion for distinguishing gross defects from a cluster of point defects.","PeriodicalId":362167,"journal":{"name":"Proceedings of International Workshop on Defect and Fault Tolerance in VLSI","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Yield projection from defect monitors: the influence of gross defects [BiCMOS process]\",\"authors\":\"Neil Harrison\",\"doi\":\"10.1109/DFTVS.1995.476947\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Accurate yield projection requires an appreciation of the role of gross or area defects. Yield projection from defect monitors can only be successful if the presence of gross defects is handled correctly. This paper presents a technique for the identification of such defects and quantifies the effect on projected yield of varying the criterion for distinguishing gross defects from a cluster of point defects.\",\"PeriodicalId\":362167,\"journal\":{\"name\":\"Proceedings of International Workshop on Defect and Fault Tolerance in VLSI\",\"volume\":\"37 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of International Workshop on Defect and Fault Tolerance in VLSI\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DFTVS.1995.476947\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of International Workshop on Defect and Fault Tolerance in VLSI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DFTVS.1995.476947","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 2

摘要

准确的产量预测需要对总缺陷或面积缺陷的作用进行评估。只有在严重缺陷的存在得到正确处理的情况下，缺陷监视器的产量预测才能成功。本文提出了一种识别此类缺陷的技术，并量化了区分总体缺陷和一组点缺陷的不同标准对预计良率的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Yield projection from defect monitors: the influence of gross defects [BiCMOS process]

Accurate yield projection requires an appreciation of the role of gross or area defects. Yield projection from defect monitors can only be successful if the presence of gross defects is handled correctly. This paper presents a technique for the identification of such defects and quantifies the effect on projected yield of varying the criterion for distinguishing gross defects from a cluster of point defects.

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Proceedings of International Workshop on Defect and Fault Tolerance in VLSI

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