一种新型环保、无腐蚀的溶剂剥离后清洗方法

Vos, Rotondaro, Mertens, Meuris, Heyns
{"title":"一种新型环保、无腐蚀的溶剂剥离后清洗方法","authors":"Vos, Rotondaro, Mertens, Meuris, Heyns","doi":"10.1109/VLSIT.1997.623683","DOIUrl":null,"url":null,"abstract":"Corrosion of metal lines during the post-stripping rinse is a severe problem in multi-level metallization processes. In this paper it is demonstrated that the addition of small amounts of the inorganic acid HNO3 to the ultrapure water used for rinsing can effectively be used to suppress this corrosion without the need of an additional IPA- step.","PeriodicalId":414778,"journal":{"name":"1997 Symposium on VLSI Technology","volume":"66 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A Novel Environmentally-friendly Corrosion-free Post-stripping Rinsing Procedure After Solvent Strip\",\"authors\":\"Vos, Rotondaro, Mertens, Meuris, Heyns\",\"doi\":\"10.1109/VLSIT.1997.623683\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Corrosion of metal lines during the post-stripping rinse is a severe problem in multi-level metallization processes. In this paper it is demonstrated that the addition of small amounts of the inorganic acid HNO3 to the ultrapure water used for rinsing can effectively be used to suppress this corrosion without the need of an additional IPA- step.\",\"PeriodicalId\":414778,\"journal\":{\"name\":\"1997 Symposium on VLSI Technology\",\"volume\":\"66 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-06-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 Symposium on VLSI Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.1997.623683\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1997.623683","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

金属线在汽提后冲洗过程中的腐蚀是多级金属化过程中的一个严重问题。本文证明,在超纯水中加入少量的无机酸HNO3可以有效地抑制这种腐蚀,而不需要额外的IPA-步骤。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Novel Environmentally-friendly Corrosion-free Post-stripping Rinsing Procedure After Solvent Strip
Corrosion of metal lines during the post-stripping rinse is a severe problem in multi-level metallization processes. In this paper it is demonstrated that the addition of small amounts of the inorganic acid HNO3 to the ultrapure water used for rinsing can effectively be used to suppress this corrosion without the need of an additional IPA- step.
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