{"title":"1200v, 150a绝缘栅晶闸管","authors":"J. Ajit, D. Kinzer","doi":"10.1109/ISPSD.1995.515005","DOIUrl":null,"url":null,"abstract":"A insulated-gate thyristor (IGTH) design for achieving high controllable current capability is described. A square-cellular design with high density of MOS-channels modulating the resistance of the base region of the NPN transistor of the thyristor structure is-used. The IGTH was fabricated using a double-diffused DMOS process and 1200 V devices with controllable currents in excess of 150 A were obtained.","PeriodicalId":200109,"journal":{"name":"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"1200 V, 150 A insulated-gate thyristors\",\"authors\":\"J. Ajit, D. Kinzer\",\"doi\":\"10.1109/ISPSD.1995.515005\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A insulated-gate thyristor (IGTH) design for achieving high controllable current capability is described. A square-cellular design with high density of MOS-channels modulating the resistance of the base region of the NPN transistor of the thyristor structure is-used. The IGTH was fabricated using a double-diffused DMOS process and 1200 V devices with controllable currents in excess of 150 A were obtained.\",\"PeriodicalId\":200109,\"journal\":{\"name\":\"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.1995.515005\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of International Symposium on Power Semiconductor Devices and IC's: ISPSD '95","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.1995.515005","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A insulated-gate thyristor (IGTH) design for achieving high controllable current capability is described. A square-cellular design with high density of MOS-channels modulating the resistance of the base region of the NPN transistor of the thyristor structure is-used. The IGTH was fabricated using a double-diffused DMOS process and 1200 V devices with controllable currents in excess of 150 A were obtained.