利用低压热模块来应对先进设备制造的挑战

B. Peuse, M. Pfarr, P. Timans, Y. Hu
{"title":"利用低压热模块来应对先进设备制造的挑战","authors":"B. Peuse, M. Pfarr, P. Timans, Y. Hu","doi":"10.1109/RTP.2004.1441938","DOIUrl":null,"url":null,"abstract":"Fulfilling the needs of advanced semiconductor device manufacturing presents continued challenges to the developers and manufacturers of capital equipment. More than twenty years of RTP equipment evolution and development has resulted in the availability of a select few technologies that are capable of delivering the demanding performance required to manufacturer today's advanced semiconductor devices. This paper describes the development and characterization of a new low pressure RTP process module that was developed to fulfil some specific needs. With the use of proven existing thermal processing technology, the design, development, characterization and qualification of this module for device manufacturing was done in a very short period of time","PeriodicalId":261126,"journal":{"name":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Leveraging a low pressure thermal module to meet the challenges of advanced device manufacturing\",\"authors\":\"B. Peuse, M. Pfarr, P. Timans, Y. Hu\",\"doi\":\"10.1109/RTP.2004.1441938\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Fulfilling the needs of advanced semiconductor device manufacturing presents continued challenges to the developers and manufacturers of capital equipment. More than twenty years of RTP equipment evolution and development has resulted in the availability of a select few technologies that are capable of delivering the demanding performance required to manufacturer today's advanced semiconductor devices. This paper describes the development and characterization of a new low pressure RTP process module that was developed to fulfil some specific needs. With the use of proven existing thermal processing technology, the design, development, characterization and qualification of this module for device manufacturing was done in a very short period of time\",\"PeriodicalId\":261126,\"journal\":{\"name\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RTP.2004.1441938\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RTP.2004.1441938","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

满足先进半导体器件制造的需求对资本设备的开发商和制造商提出了持续的挑战。超过二十年的RTP设备演变和发展导致了少数技术的可用性,这些技术能够提供制造当今先进半导体设备所需的苛刻性能。本文介绍了一种新的低压RTP工艺模块的开发和特性,该模块是为满足某些特定需求而开发的。通过使用成熟的现有热处理技术,在很短的时间内完成了该器件制造模块的设计、开发、表征和鉴定
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Leveraging a low pressure thermal module to meet the challenges of advanced device manufacturing
Fulfilling the needs of advanced semiconductor device manufacturing presents continued challenges to the developers and manufacturers of capital equipment. More than twenty years of RTP equipment evolution and development has resulted in the availability of a select few technologies that are capable of delivering the demanding performance required to manufacturer today's advanced semiconductor devices. This paper describes the development and characterization of a new low pressure RTP process module that was developed to fulfil some specific needs. With the use of proven existing thermal processing technology, the design, development, characterization and qualification of this module for device manufacturing was done in a very short period of time
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信