氢自由基法去除铜表面氧化物

S. Shin, E. Higurashi, K. Furuyama, T. Suga
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引用次数: 3

摘要

采用氢自由基法去除金属铜的氧化层。利用x射线光电子能谱(XPS)检测到氧化层的成功去除,处理后发生了可见的颜色变化。进一步分析了再氧化周期,并与氩离子束和快原子束(FAB)处理进行了比较。该方法引入了一种非常有前途的技术来去除金属的氧化层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hydrogen radical treatment for surface oxide removal from copper
Hydrogen radicals were used to remove the oxide layer of copper metal. Successful removal of the oxide layer was detected using X-ray photoelectron spectroscopy (XPS), where the visible color change has occurred after the treatment. Period of re-oxidization was further analyzed which then was compared to argon ion beam and fast atom beam (FAB) treatment. The approach has introduced a highly promising technique to remove oxide layers of metals.
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