基于SU-8导体的共面波导传输线高频设计与特性研究

Felix D. Mbairi, H. Hesselbom
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引用次数: 62

摘要

环氧基负光刻胶SU8广泛应用于MEMS(微机电系统)领域,并以其形成高纵横比厚层的能力和耐化学性而闻名。然而,只有少数论文研究了这种材料的电学特性,而且大多是在MEMS领域或较低的频率范围内。本文介绍了一种采用SU-8介质材料的共面波导(CBCPW)传输线的设计和特性。共面传输线是使用EDA工具精心设计的,并在涂有SU-8材料的金属化玻璃基板上制造。使用矢量网络分析仪和探针站在45 MHz至50 GHz范围内进行s参数测量。通过这些测量,可以确定传输线的特性阻抗、衰减常数、有效介电常数、损耗正切等参数。本文介绍了其设计过程、制作过程和测试结果。据我们所知,这是SU-8材料首次在微电子中使用CBCPW传输线进行表征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High frequency design and characterization of SU-8 based conductor backed coplanar waveguide transmission lines
The epoxy-based negative photoresist SU8 is widely, used within the MEMS (microelectromechanical systems) community, and is well known for its ability to form thick layers with high aspect ratios and for its chemical resistance. However, only a few papers have investigated the electrical properties of this material and mostly within the MEMS area or at lower frequency ranges. This paper presents the design and characterization of conductor-backed coplanar waveguide (CBCPW) transmission lines using SU-8 dielectric material. The coplanar transmission lines are carefully designed using EDA tools, and fabricated on a metallized glass substrate coated with SU-8 material. S-parameter measurements are performed from 45 MHz to 50 GHz using a vector network analyzer and a probe station. From these measurements, transmission line parameters such as characteristic impedance, attenuation constant, effective dielectric constant, loss tangent, etc, are determined. The design procedure, fabrication process and measurement results are described in this paper. To our knowledge, this is the first time the SU-8 material is characterized in microelectronics using CBCPW transmission lines.
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