优化隧道场效应管性能——器件结构、晶体管尺寸和材料选择的影响

J. Knoch
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引用次数: 35

摘要

近年来,隧道场效应管(tfet)受到了广泛的关注[1-9]。这样做的原因是tfet可能允许超过60mV/dec的限制,从而最终能够降低ic的功耗。然而,tfet通常表现出不如传统MOSFET的状态性能。此外,为了获得优异的非状态tfet,必须在几个数量级的电流中表现出远小于60mV/dec的亚阈值波动。本文将讨论器件结构、尺寸和材料选择对tfet性能的影响。特别地,异质结构和一维纳米线的使用将被详细地分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimizing tunnel FET performance - Impact of device structure, transistor dimensions and choice of material
In recent years tunnel FETs (TFETs) have attracted a great deal of attention [1–9]. The reason for this is that TFETs potentially allow beating the 60mV/dec limit and thus eventually enable lowering the power consumption of ICs. However, TFETs usually exhibit an onstate performance inferior to a conventional MOSFET. Moreover, in order to obtain a superior off-state TFETs must exhibit subthreshold swings substantially smaller than 60mV/dec over several orders of magnitude in current. In the present paper the impact of device structure, dimensions and the choice of material on the performance of TFETs will be discussed. In particular, the use of heterostructures and one-dimensional nanowires will be analyzed in detail.
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