ZnO薄膜在光照下的力学性能和变形行为

Peter Horvaithl, G. Kiriakidis, Peter M. Nagy, S. Christoulakis
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引用次数: 2

摘要

氧化锌(ZnO)作为一种具有高激子结合能(60 meV)的宽带隙半导体,具有广泛的应用前景。本研究的主要目的是研究直流磁控溅射技术生长的未掺杂ZnO薄膜的力学性能和变形行为,并考虑其在SPM悬臂梁上的可能应用。为了研究在相同溅射条件下沉积的ZnO厚度系列的力学性能,采用了纳米压痕技术和划痕试验。利用低功率汞灯在黑暗和光照条件下对特定ZnO/Si和ZnO/玻璃结构进行纳米压痕测量,目的是了解紫外线照射对ZnO层机械性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanical Properties and Deformation Behavior of ZnO Thin Films under Illumination
As a wide band gap semiconductor with a large exciton binding energy (60 meV), zinc oxide (ZnO) has many existing and promising future applications. The main objective of this work was to study the mechanical properties and deformation behavior of undoped ZnO thin films grown by direct current magnetron sputtering technique in the light of their possible application on SPM cantilevers. Nanoindentation techniques and scratch tests were carried out in order to investigate mechanical properties of a ZnO thickness series deposited under the same sputtering conditions. Nanoindentation measurements were also applied on specific ZnO/Si and ZnO/glass structures in darkness and under illumination utilizing a low power mercury lamp with the aim of understanding the impact of the UV irradiation on the mechanical properties of the ZnO layer.
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