{"title":"室温键合聚甲基戊二酰亚胺的层转移方法","authors":"T. Matsumae, T. Suga","doi":"10.1109/ICEP.2016.7486836","DOIUrl":null,"url":null,"abstract":"Room temperature bonding of Polymethylglutarimide was performed for a damage-free layer transfer method. The PMGI layer was bonded to support Si wafer by using the Surface activated bonding method using nano-adhesion layers. Using SAB, bonded area covering around 90% of the wafer surface, with a room temperature bond strength of ~1 J/m2 is achieved. Micro voids at bond interface are never observed using scanning electron microscope. For debonding process, PMGI dissolve in N-methylpyrrolidone based solvent. Extremely small amount PMGI residues are detected by using atomic force microscope surface profile.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Room temperature bonding of Polymethylglutarimide for layer transfer method\",\"authors\":\"T. Matsumae, T. Suga\",\"doi\":\"10.1109/ICEP.2016.7486836\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Room temperature bonding of Polymethylglutarimide was performed for a damage-free layer transfer method. The PMGI layer was bonded to support Si wafer by using the Surface activated bonding method using nano-adhesion layers. Using SAB, bonded area covering around 90% of the wafer surface, with a room temperature bond strength of ~1 J/m2 is achieved. Micro voids at bond interface are never observed using scanning electron microscope. For debonding process, PMGI dissolve in N-methylpyrrolidone based solvent. Extremely small amount PMGI residues are detected by using atomic force microscope surface profile.\",\"PeriodicalId\":343912,\"journal\":{\"name\":\"2016 International Conference on Electronics Packaging (ICEP)\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-04-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 International Conference on Electronics Packaging (ICEP)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICEP.2016.7486836\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Conference on Electronics Packaging (ICEP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICEP.2016.7486836","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Room temperature bonding of Polymethylglutarimide for layer transfer method
Room temperature bonding of Polymethylglutarimide was performed for a damage-free layer transfer method. The PMGI layer was bonded to support Si wafer by using the Surface activated bonding method using nano-adhesion layers. Using SAB, bonded area covering around 90% of the wafer surface, with a room temperature bond strength of ~1 J/m2 is achieved. Micro voids at bond interface are never observed using scanning electron microscope. For debonding process, PMGI dissolve in N-methylpyrrolidone based solvent. Extremely small amount PMGI residues are detected by using atomic force microscope surface profile.