J. Tinoco, C. Urban, M. Emam, S. Mantl, Q. Zhao, J. Raskin
{"title":"n型肖特基势垒mosfet的非线性分析","authors":"J. Tinoco, C. Urban, M. Emam, S. Mantl, Q. Zhao, J. Raskin","doi":"10.1109/SOI.2010.5641391","DOIUrl":null,"url":null,"abstract":"In the last few years, many efforts have been made looking for the improvement of the DC and RF performance of MOS transistors. In this scope, Schottky-Barrier transistors appear as very interesting alternative to conventional devices. In this paper we present the non-linear behavior of dopant segregated n-type SB-MOSFETs with 180 nm channel length.","PeriodicalId":227302,"journal":{"name":"2010 IEEE International SOI Conference (SOI)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-11-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Non-linear analysis of n-type Schottky-Barrier MOSFETs\",\"authors\":\"J. Tinoco, C. Urban, M. Emam, S. Mantl, Q. Zhao, J. Raskin\",\"doi\":\"10.1109/SOI.2010.5641391\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the last few years, many efforts have been made looking for the improvement of the DC and RF performance of MOS transistors. In this scope, Schottky-Barrier transistors appear as very interesting alternative to conventional devices. In this paper we present the non-linear behavior of dopant segregated n-type SB-MOSFETs with 180 nm channel length.\",\"PeriodicalId\":227302,\"journal\":{\"name\":\"2010 IEEE International SOI Conference (SOI)\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-11-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 IEEE International SOI Conference (SOI)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOI.2010.5641391\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International SOI Conference (SOI)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.2010.5641391","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Non-linear analysis of n-type Schottky-Barrier MOSFETs
In the last few years, many efforts have been made looking for the improvement of the DC and RF performance of MOS transistors. In this scope, Schottky-Barrier transistors appear as very interesting alternative to conventional devices. In this paper we present the non-linear behavior of dopant segregated n-type SB-MOSFETs with 180 nm channel length.