{"title":"时域反射法在评价绿环氧模包覆金丝键中不规则金属间化合物生长中的应用","authors":"Jason Wong, Alvin Seah, Spencer Chew","doi":"10.1109/IPFA.2007.4378085","DOIUrl":null,"url":null,"abstract":"In this paper, we have successfully used the comparative TDR technique as a means to detect and locate intermittent electrical failures in various packaged devices caused by weak interconnect interfaces or transmission traces that are degraded due to electromigration or intermetallic diffusion processes. A series of different common fail signatures from the resultant TDR waveforms can be correlated with cross section images of weak interconnect interfaces will be shared.","PeriodicalId":334987,"journal":{"name":"2007 14th International Symposium on the Physical and Failure Analysis of Integrated Circuits","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Application of Time Domain Reflectometry in Evaluating Irregular Inter-metallic Compound Growth in Gold Wire Bonds Encapsulated with Green Epoxy Mold Compound\",\"authors\":\"Jason Wong, Alvin Seah, Spencer Chew\",\"doi\":\"10.1109/IPFA.2007.4378085\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we have successfully used the comparative TDR technique as a means to detect and locate intermittent electrical failures in various packaged devices caused by weak interconnect interfaces or transmission traces that are degraded due to electromigration or intermetallic diffusion processes. A series of different common fail signatures from the resultant TDR waveforms can be correlated with cross section images of weak interconnect interfaces will be shared.\",\"PeriodicalId\":334987,\"journal\":{\"name\":\"2007 14th International Symposium on the Physical and Failure Analysis of Integrated Circuits\",\"volume\":\"10 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-07-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 14th International Symposium on the Physical and Failure Analysis of Integrated Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IPFA.2007.4378085\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 14th International Symposium on the Physical and Failure Analysis of Integrated Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2007.4378085","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Application of Time Domain Reflectometry in Evaluating Irregular Inter-metallic Compound Growth in Gold Wire Bonds Encapsulated with Green Epoxy Mold Compound
In this paper, we have successfully used the comparative TDR technique as a means to detect and locate intermittent electrical failures in various packaged devices caused by weak interconnect interfaces or transmission traces that are degraded due to electromigration or intermetallic diffusion processes. A series of different common fail signatures from the resultant TDR waveforms can be correlated with cross section images of weak interconnect interfaces will be shared.