InAs/AlSb hemt的栅极泄漏建模

M. Ancona, J. B. Boos, N. Papanicolaou, W. Chang, B. R. Bennett, D. Park
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引用次数: 0

摘要

为了模拟InAs/AlSb hemt中的栅极泄漏,我们在密度梯度理论的框架内创建了一个详细的模型,该模型包含了整个InAs/AlSb异质结构,InAs井中的量子约束和非抛物线效应以及II型InAs/AlSb异质结的生成/重组(通过空间间接手对手过程和界面陷阱)。每一种成分都是单独描述的,然后把它们放在一起作为栅极泄漏的模型。初步的泄漏模拟与实验的比较表明,界面陷阱对于理解其行为是必不可少的,特别是在低电压下。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling gate leakage in InAs/AlSb HEMTs
To simulate gate leakage in InAs/AlSb HEMTs, we create a detailed model within the framework of density gradient theory that incorporates the entire InAs/AlSb heterostructure, the quantum confinement and non-parabolicity effects in the InAs well and generation/recombination at the Type II InAs/AlSb heterojunction (via both the spatially indirect hand-to-hand process and interface traps). Each of these ingredients is described individually and they are then put together as a model of gate leakage. Comparisons of preliminary leakage simulations with experiment suggest that interface traps are essential for understanding the behavior especially at low voltages.
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